A computational study of van der Waals tunnel transistors: Fundamental aspects and design challenges

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Küçük Resim

Tarih

2015

Dergi Başlığı

Dergi ISSN

Cilt Başlığı

Yayıncı

Institute of Electrical and Electronics Engineers Inc.

Erişim Hakkı

info:eu-repo/semantics/openAccess

Özet

We propose a model Hamiltonian for van der Waals tunnel transistors relying on a few physical parameters that we calibrate against DFT band structure calculations. This approach allowed us to develop a fully three-dimensional (3-D) NEGF based simulator and to investigate fundamental and design aspects related to van der Waals tunnel transistors, such as: (a) area and edge tunneling components, and scaling with device area; (b) impact of top gate alignment and back-oxide thickness on the device performance; (c) influence of inelastic phonon scattering on the device operation and sub-threshold swing; (d) benchmarking of switching energy and delay. © 2015 IEEE.

Açıklama

IEEE Electron Devices Society
61st IEEE International Electron Devices Meeting, IEDM 2015 -- 7 December 2015 through 9 December 2015 -- -- 119534

Anahtar Kelimeler

Kaynak

Technical Digest - International Electron Devices Meeting, IEDM

WoS Q Değeri

N/A

Scopus Q Değeri

Q2

Cilt

2016-February

Sayı

Künye